ヤナセ　タカシ   Yanase Takashi   柳瀨　隆    所属   東邦大学  理学部 化学科    職種   講師
論文種別	原著
言語種別	英語
査読の有無	査読あり
表題	Versatile Simple Doping Technique for Diamond by Solid Dopant Source Immersion during Microwave Plasma CVD
掲載誌名	正式名：CHEMISTRY LETTERS ISSNコード：0366-7022/1348-0715
出版社	CHEMICAL SOC JAPAN
巻・号・頁	43(10),pp.1569-1571
著者・共著者	Takahiro Tamura,Takashi Yanase,Taro Nagahama,Makoto Wakeshima,Yukio Hinatsu,Toshihiro Shimada
発行年月	2014/10
概要	We demonstrate a new doping technique for chemical vapor deposition (CVD) growth of diamond. The method involves immersing a solid-state dopant source into the plasma during microwave plasma-assisted CVD. We applied this simple and versatile technique to the growth of boron-doped diamond. The grown films were characterized by X-ray diffraction (XRD), Raman microscopy, glow discharge optical emission spectroscopy (GDOES), and electrical conductivity measurements. The average concentration of boron was 0.5 atom % and the conductivity was 1.5 x 10(-2) Omega cm, which showed irregular behavior at low temperature.
DOI	10.1246/cl.140598
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