ヤナセ　タカシ   Yanase Takashi   柳瀨　隆    所属   東邦大学  理学部 化学科    職種   講師
論文種別	原著
言語種別	英語
査読の有無	査読あり
表題	N-2 plasma etching processes of microscopic single crystals of cubic boron nitride
掲載誌名	正式名：JAPANESE JOURNAL OF APPLIED PHYSICS ISSNコード：0021-4922/1347-4065
出版社	IOP PUBLISHING LTD
巻・号・頁	56(6)
著者・共著者	Takahiro Tamura,Takuya Takami,Takashi Yanase,Taro Nagahama,Toshihiro Shimada
発行年月	2017/06
概要	We studied the N-2 plasma etching of cubic boron nitride (cBN). We have developed experimental techniques for handling 200-mu m-size single crystals for the preparation of surfaces with arbitrary crystal indexes, plasma processes, and surface analyses. We successfully prepared smooth surfaces of cBN with roughness smaller than 10 nm and found that the etching behavior was strongly influenced by the surface indexes. The morphology of the etched surfaces can be explained by the chemical stability of (111)B surfaces. (C) 2017 The Japan Society of Applied Physics
DOI	10.7567/JJAP.56.06HF01